| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide improved cathode arc deposition systems with improved macro-particle filtering. <P>SOLUTION: An arc source filter is disposed between an arc cathode 12 and a substrate 20 in a vacuum arc deposition system. The filter includes a plurality of duct elements 26, 28, 30, 32 that surround an arc source. The duct elements have sufficient spatial dimensions to block particles. In addition, the duct elements have electrical and magnetic properties that are conducive for plasma transmission through the filter. On passing through the filter, the highly ionized arc plasma is essentially rid of particles making a source plasma for reacted as well as un-reacted coatings characterized by high density and near defect free quality. The design allows for flexibility in terms of filtering degree, length of coating zone as well as choice of arc source. <P>COPYRIGHT: (C)2012,JPO&INPIT |
