发明名称 METHOD FOR FORMING FILM OF SILANE COUPLING AGENT, AND METHOD FOR MANUFACTURING INKJET HEAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming a film of silane coupling agent in which a film of silane coupling agent can be formed evenly and firmly on a surface of a target substrate by a simple film forming apparatus, a reset time required between the completion of a film forming cycle to the beginning of the following film forming cycle is shortened, and a continuous process can be performed satisfactorily, and to provide a method for manufacturing an inkjet head using the same. <P>SOLUTION: The method includes: a first process of introducing silane coupling agent in a gas phase into a chamber 301, and adsorbing the silane coupling agent to an inner wall 301a of the chamber 301; and a second process of introducing the target substrate 125 into the chamber 301, leaving the target substrate 125 in the chamber 301 with no additional introduction of silane coupling agent in a gas phase into the chamber 301, and forming a film of the silane coupling agent desorbed from the inner wall 301a on the surface of the target substrate 125. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012179856(A) 申请公布日期 2012.09.20
申请号 JP20110045480 申请日期 2011.03.02
申请人 SEIKO EPSON CORP 发明人 CHITATE KOSUKE
分类号 B41J2/045;B41J2/055 主分类号 B41J2/045
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