| 摘要 |
PURPOSE: A method and apparatus for cleaning a semiconductor using micro nano bubbles are provided to prevent the inflow of contaminants or water in the following cleaning section by forming an air curtain between cleaning sections. CONSTITUTION: A micro nano bubble generator(10) generates functional water as micro nano bubbles of 5 nm or less and includes a mixing pump(11), a bubble generator(12), and a spray pump(14). An air curtain(61) is located between a first cleaning bath and a second cleaning bath. A rinse bath(40) cleans a semiconductor substrate by spraying deionized water. A drying bath(50) dries the semiconductor substrate with dried air. [Reference numerals] (11) Mixing pump; (12) Bubble generator; (13) Micro nano bubble tank (4 level sensors); (14) Spray pump; (61,62,63) Air curtain; (AA) Substrate input; (BB) Cleaning 1 section; (CC) Bubble spraying cleaning; (DD) Cleaning 2 section; (EE) 2 stream spraying cleaning; (FF) Rinse 3 section; (GG) Deionized water spraying rinse; (HH) Dry 4 section; (II) Air knife dry; (JJ) Substrate output; (KK) Supply; (LL) Circulation; (MM) Deionized water; (NN) Ozone; (OO) Nitrogen
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