发明名称 PROTECTION SHEET OF SEMICONDUCTOR WAFER AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a protection sheet of a semiconductor wafer which improves the adhesion with the semiconductor wafer and prevents grinding water from intruding into the semiconductor wafer. <P>SOLUTION: As shown in FIG. 1, a protection sheet 100 of a semiconductor wafer includes: a base material layer 110, an adhesion layer 120 formed on the base material layer 110, and a slit 130 formed in the adhesion layer 120 and existed in a position that overlaps with an outer periphery of the semiconductor wafer 200 in a plain view. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012227191(A) 申请公布日期 2012.11.15
申请号 JP20110090638 申请日期 2011.04.15
申请人 RENESAS ELECTRONICS CORP 发明人 TAZAKI YOSUKE
分类号 H01L21/304 主分类号 H01L21/304
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