发明名称 Semiconductor Device and A Method of Manufacturing the Same
摘要 A reduction in contaminating impurities in a TFT, and a TFT which is reliable, is obtained in a semiconductor device which uses the TFT. By removing contaminating impurities residing in a film interface of the TFT using a solution containing fluorine, a reliable TFT can be obtained.
申请公布号 US2013005094(A1) 申请公布日期 2013.01.03
申请号 US201213608507 申请日期 2012.09.10
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;KADONO MASAYA;YAMAZAKI SHUNPEI;YAMAUCHI YUKIO;KITAKADO HIDEHITO 发明人 KADONO MASAYA;YAMAZAKI SHUNPEI;YAMAUCHI YUKIO;KITAKADO HIDEHITO
分类号 H01L21/322;H01L21/336 主分类号 H01L21/322
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