发明名称 METHOD OF EVALUATING QUALITY OF WAFER OR SINGLE CRYSTAL INGOT AND METHOD OF CONTROLLING QUALITY OF SINGLE CRYSTAL INGOT BY USING THE SAME
摘要 Provided is a method of evaluating quality of a wafer or a single crystal ingot and a method of controlling quality of a single crystal ingot by using the same. The method of evaluating quality of a wafer or a single crystal ingot according to an embodiment may include performing Cu (copper) haze evaluation on a wafer or a slice of a single crystal ingot and Cu haze scoring with respect to the result of the Cu haze evaluation.
申请公布号 WO2013005975(A2) 申请公布日期 2013.01.10
申请号 WO2012KR05286 申请日期 2012.07.03
申请人 LG SILTRON INC.;JANG, YUN-SEON;HONG, YOUNG-HO;JUNG, YO-HAN;KIM, SE-HUN 发明人 JANG, YUN-SEON;HONG, YOUNG-HO;JUNG, YO-HAN;KIM, SE-HUN
分类号 主分类号
代理机构 代理人
主权项
地址