APPARATUS FOR ATOMIC LAYER DEPOSITION

摘要

PURPOSE: An atomic layer deposition device is provided to improve deposition speed and membrane quality by increasing the speed of a purge process with enhanced structure of a purge gas injection nozzle. CONSTITUTION: An atomic layer deposition device comprises a reaction chamber, a substrate support, and a shower head. At least one of the substrate support and the shower head is installed to move in a first direction. Each nozzle set comprises a first nozzle set(111) for depositing first source gas and a second nozzle set(112) for depositing second source gas. The first nozzle set comprises a first source gas injection nozzle(211), a purge gas injection nozzle(301), and a purge gas outlet(311). The second nozzle set comprises a second source gas injection nozzle(221), the purge gas injection nozzle, and the purge gas outlet.