| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress extension of drawing time due to a wait for data processing. <P>SOLUTION: A charged particle beam drawing device 1 includes: a drawing data processing part 32 for dividing a drawing region defined by drawing data for drawing a pattern on a sample W into a plurality of stripe regions, dividing the stripe regions into a plurality of distribution processing regions or regarding them as one distribution processing region according to a first specified value of a data amount for each stripe region, and processing the drawing data for each distribution processing region in parallel; and a drawing part 2 for performing drawing with a charged particle beam with respect to the sample W for each stripe region or distribution processing region on the basis of the data for each distribution processing region generated by the drawing data processing part 32. The drawing data processing part 32 subdivides the stripe region in the beginning of the drawing or the stripe region in the end of the drawing among the plurality of stripe regions into a plurality of distribution processing regions in which a data amount is equal to or less than a second specified vale which is smaller than the first specified value. <P>COPYRIGHT: (C)2013,JPO&INPIT |
