发明名称 METHOD OF MANUFACTURING PATTERN DRAWN FABRIC
摘要 <P>PROBLEM TO BE SOLVED: To provide a laser pattern drawing method which allows laser irradiation device to be free from a selective irradiation calculation element for selectively emitting laser beam in the process of drawing patterns on fabric 12 with laser beam emitted from the laser irradiation device 11. <P>SOLUTION: A laser pattern drawing method comprises the steps of: putting an object on a straight path 14 of a laser beam 13 from laser irradiation device 11 to a fabric 12 in a process of laser pattern drawing so as to prevent the straight of the laser beam 13; drawing pattern on the fabric 12 with or without the object. Conventional pattern drawing device used in fields of such as weaving technique, tufted technique and inkjet printing technique is applied to means for selectively putting the object on the straight path 14. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013023781(A) 申请公布日期 2013.02.04
申请号 JP20110159341 申请日期 2011.07.20
申请人 TB KAWASHIMA CO LTD 发明人
分类号 D06C23/00;B23K26/00;B23K26/06;D04D7/00 主分类号 D06C23/00
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