发明名称 MANUFACTURING METHOD OF N-TYPE DIFFUSION LAYER AND MANUFACTURING METHOD OF SOLAR CELL ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an n-type diffusion layer and a manufacturing method of a solar cell element which are capable of forming an n-type diffusion layer in a specific part and in which characteristic deterioration caused by remaining organic substances is small. <P>SOLUTION: When an n-type diffusion layer 12 is formed using an n-type diffusion layer formation composition 11 containing a glass powder including a donor element and a dispersion medium including an organic substance, organic components included in the dispersion medium are sufficiently removed before thermal diffusion treatment. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013026578(A) 申请公布日期 2013.02.04
申请号 JP20110162641 申请日期 2011.07.25
申请人 HITACHI CHEM CO LTD 发明人
分类号 H01L31/04 主分类号 H01L31/04
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