发明名称 MOUNTING TABLE TEMPERATURE CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To locally bring the temperature at a desired part in the surface higher or lower than the set temperature of the entire surface of a mounting table. <P>SOLUTION: A main passage 320 formed in a mounting table 200 over the entire surface thereof, an auxiliary passage 330 formed partially in the surface of the mounting table on the upper side of the main passage while separated therefrom, and a temperature control medium circulation mechanism which supplies a temperature control medium adjusted to a predetermined set temperature to the main passage and circulates the medium therethrough, shunts the temperature control medium, and then supplies the temperature control medium to the auxiliary passage and circulates the medium therethrough after adjusting to a temperature higher or lower than the set temperature are provided. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013026387(A) 申请公布日期 2013.02.04
申请号 JP20110158950 申请日期 2011.07.20
申请人 TOKYO ELECTRON LTD 发明人
分类号 H01L21/3065;C23C16/46;H01L21/31 主分类号 H01L21/3065
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