发明名称 |
Chemical for Forming Protective Film |
摘要 |
Disclosed is a liquid chemical for forming a water repellent protective film on a wafer that has at its surface a finely uneven pattern and contains silicon element at least at a part of the uneven pattern, the water repellent protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains: a silicon compound (A) represented by the general formula R1aSi(H)b(X)4−a−b and an acid; or a silicon compound (C) represented by the general formula R7gSi(H)h(CH3)w(Z)4−g−h−w and a base that contains no more than 35 mass % of water. The total amount of water in the liquid chemical is no greater than 1000 mass ppm relative to the total amount of the liquid chemical. The liquid chemical can improve a cleaning step that easily induces pattern collapse.
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申请公布号 |
US2013056023(A1) |
申请公布日期 |
2013.03.07 |
申请号 |
US201113698244 |
申请日期 |
2011.05.11 |
申请人 |
KUMON SOICHI;SAIO TAKASHI;ARATA SHINOBU;SAITO MASANORI;RYOKAWA ATSUSHI;YAMADA SHUHEI;NANAI HIDEHISA;AKAMATSU YOSHINORI;CENTRAL GLASS COMPANY, LIMITED |
发明人 |
KUMON SOICHI;SAIO TAKASHI;ARATA SHINOBU;SAITO MASANORI;RYOKAWA ATSUSHI;YAMADA SHUHEI;NANAI HIDEHISA;AKAMATSU YOSHINORI |
分类号 |
C09K3/18;B08B3/10 |
主分类号 |
C09K3/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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