SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

摘要

PURPOSE: A substrate processing apparatus and a substrate processing method are provided to quickly clean a total area by using a substrate transfer robot including a cleaning member. CONSTITUTION: A load lock unit(20) is arranged between a loading/unloading unit(10) and a process unit(30). A transfer member moves a substrate to the process unit and the load lock unit. A tray support unit is parallel to a substrate transfer plate. A transfer robot moves the substrate on a tray. The transfer robot includes a cleaning member for the tray.