发明名称 |
FERROELECTRIC CAPACITOR FOR FLEXIBLE NONVOLATILE MEMORY DEVICE, FLEXIBLE NONVOLATILE FERROELECTRIC MEMORY DEVICE, AND MANUFACTURING METHOD FOR THE SAME |
摘要 |
<p>PURPOSE: A ferroelectric capacitor for a flexible nonvolatile memory device, a flexible nonvolatile ferroelectric memory device, and a method for manufacturing the same are provided to easily process a device. CONSTITUTION: A semiconducting channel layer(510) is formed on a flexible substrate(500). A source and a drain region(520,530) are formed at both sides of the semiconductor channel layer. A polymer bonding layer is formed on the semiconductor channel layer. A gate electrode(590) is formed on a ferroelectric layer(550). The source and the drain electrode(570,580) are formed on the source and the drain region.</p> |
申请公布号 |
KR20130028769(A) |
申请公布日期 |
2013.03.19 |
申请号 |
KR20130023038 |
申请日期 |
2013.03.04 |
申请人 |
RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY |
发明人 |
AHN, JONG HYUN;RHO, JONG HYUN |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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