INJECTION UNIT AND APPARATUS FOR TREATING SUBSTRATE WITH THE UNIT

摘要

PURPOSE: An injection unit and a substrate processing apparatus with the same are provided to control the relative distance between a first and a second nozzle and to prevent the contamination of the second nozzle due to a chemical solution discharged from the first nozzle. CONSTITUTION: A first nozzle(396) sprays a first chemical solution. A second nozzle(430) sprays a second chemical solution. A first support unit(392) supports the first nozzle and the second nozzle. A control member(425) changes the relative position between the first nozzle and the second nozzle. The control member includes a bracket(410) combined with the first support unit and a second support unit(420) for horizontally transferring the second nozzle.