Energy beam irradiation system i.e. ion implantation system, for irradiating ionic beam as e.g. electron beam on work plate, has irradiation regions partially overlapping with each other in direction perpendicular to orbital surfaces

摘要

The system (100) has an energy beam emitting mechanism emitting an energy beam (IB) to preset irradiation regions for irradiating two work plates (W1, W2) as objects. Two orbiting mechanisms (1, 2) place the plates on respective preset orbits including the irradiation regions, where the two regions surrounded by the respective orbits partially overlap with each other in a direction perpendicular to orbital surfaces formed by the orbits. One of the orbiting mechanisms includes a control unit comprising an electrical circuit to control a rotation unit (13) and a linear displacement unit (15).