发明名称 Electrical Connection Structure
摘要 A structure comprises a top metal connector formed underneath a bond pad. The bond pad is enclosed by a first passivation layer and a second passivation layer. A polymer layer is further formed on the second passivation layer. The dimension of an opening in the first passivation layer is less than the dimension of the top metal connector. The dimension of the top metal connector is less than the dimensions of an opening in the second passivation layer and an opening in the polymer layer.
申请公布号 US2013134563(A1) 申请公布日期 2013.05.30
申请号 US201113308249 申请日期 2011.11.30
申请人 CHUANG YAO-CHUN;HUANG CHANG-CHIA;LIN TSUNG-SHU;KUO CHEN-CHENG;CHEN CHEN-SHIEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHUANG YAO-CHUN;HUANG CHANG-CHIA;LIN TSUNG-SHU;KUO CHEN-CHENG;CHEN CHEN-SHIEN
分类号 H01L23/58;H01L21/28;H01L23/48 主分类号 H01L23/58
代理机构 代理人
主权项
地址