发明名称 COMPOSITION AND METHOD FOR PLANARIZING SURFACES
摘要 THE INVENTION PROVIDES COMPOSITIONS AND METHODS FOR PLANARIZING OR POLISHING A SURFACE. ONE COMPOSITION COMPRISES ABOUT 0.01 WT. % TO ABOUT 20 WT. % ?-ALUMINA PARTICLES, WHEREIN THE ?-ALUMINA PARTICLES HAVE AN AVERAGE DIAMETER OF 200 NM OR LESS, AND 80% OF THE ?-ALUMINA PARTICLES HAVE A DIAMETER OF ABOUT 500 NM OR LESS, AN ORGANIC ACID, A CORROSION INHIBITOR, AND WATER. ANOTHER COMPOSITION COMPRISES ?-ALUMINA PARTICLES, AN ORGANIC ACID, DUAL CORROSION INHIBITORS OF TRIAZOLE AND BENZOTRIAZOLE, WHEREIN THE WT. % RATIO OF THE TRIAZOLE TO BENZOTRIAZOLE IS ABOUT 0.1 TO ABOUT 4.8, AND WATER.
申请公布号 MY148917(A) 申请公布日期 2013.06.14
申请号 MY2008PI00903 申请日期 2006.09.21
申请人 CABOT MICROELECTRONICS CORPORATION 发明人 WANG, YUCHUN;AGGIO, JASON;LU, BIN;PARKER, JOHN;ZHOU, RENJIE
分类号 C09G1/02 主分类号 C09G1/02
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