发明名称 |
RETICLE SYSTEM FOR MANUFACTURING INTEGRATED CIRCUIT SYSTEMS |
摘要 |
RETICLE SYSTEM FOR MANUFACTURING INTEGRATED CIRCUIT SYSTEMSA reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit5 system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow.Fig. 7 |
申请公布号 |
SG190497(A1) |
申请公布日期 |
2013.06.28 |
申请号 |
SG20120052882 |
申请日期 |
2009.05.18 |
申请人 |
GLOBALFOUNDRIES SINGAPORE PTE. LTD. |
发明人 |
CHUA GEK SOON;TAN SIA KIM;CHOI BYOUNG-IL;CHONG KHOON KHYE RYAN;YEO KWEE LIANG MARTIN |
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