| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition in which occurrence of pixel pattern separation is prevented even when the pixel size is made finer, and which has excellent resolution, and to provide a color filter for solid state imaging device thereof and a manufacturing method of the same.SOLUTION: The photosensitive composition is used for a material of a color filter, and contains a colorant, monomer, polymer, a photoinitiator, a solvent, and a polymerization inhibitor of a phenolic compound. A content amount of the colorant is 40 mass% or more and 60 mass% or less in terms of a total solid component. A content amount of the polymerization inhibitor is 1.0×10mass% or more and 3.0×10mass% or less. A mass ratio of the polymerization inhibitor to the monomer is 5.0×10% or more and 2.0% or less. |
