发明名称 TREATMENT METHOD OF CURED FILM, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a cured film obtained by thermosetting a resin composition, which is improved in adhesion with a metal film (metal wiring layer).SOLUTION: A treatment method of a cured film includes: subjecting a cured film, which is formed by applying a resin composition containing an alkali-soluble resin and a silicone compound on a substrate, to oxygen plasma treatment followed by reverse sputtering, and continuously forming films of a barrier metal and Cu thereon in this order. In that case, the surface roughness (Ra2) of the surface of the cured film after reverse sputtering, as measured by an atom force microscope (AFM), is 35% or more and 95% or less of the surface roughness (Ra1) thereof before reverse sputtering.
申请公布号 JP2013151627(A) 申请公布日期 2013.08.08
申请号 JP20120049888 申请日期 2012.03.07
申请人 SUMITOMO BAKELITE CO LTD 发明人 TOYODA HIDEYUKI;KENMOCHI TOMONORI;BANBA TOSHIO
分类号 C08J7/00;G03F7/023;G03F7/40;H01L21/027;H01L21/312 主分类号 C08J7/00
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