发明名称 |
FINFET STRUCTURE WITH NOVEL EDGE FINS |
摘要 |
<p>PURPOSE: A finFET structure with novel edge fins is provided to increase surface areas by reducing the width variations of edge fins on an active area. CONSTITUTION: A semiconductor substrate includes a plurality of active areas. The active areas include separated fins. The separated fins are divided into regular fins (301A) and edge fins (303A). Metal lines (309) are connected to the regular fins. Gate structures (305) are formed across the separated fins.</p> |
申请公布号 |
KR20130091238(A) |
申请公布日期 |
2013.08.16 |
申请号 |
KR20120139472 |
申请日期 |
2012.12.04 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHEN CHUNG HUI |
分类号 |
H01L29/78;H01L27/088 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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