发明名称 FINFET STRUCTURE WITH NOVEL EDGE FINS
摘要 <p>PURPOSE: A finFET structure with novel edge fins is provided to increase surface areas by reducing the width variations of edge fins on an active area. CONSTITUTION: A semiconductor substrate includes a plurality of active areas. The active areas include separated fins. The separated fins are divided into regular fins (301A) and edge fins (303A). Metal lines (309) are connected to the regular fins. Gate structures (305) are formed across the separated fins.</p>
申请公布号 KR20130091238(A) 申请公布日期 2013.08.16
申请号 KR20120139472 申请日期 2012.12.04
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN CHUNG HUI
分类号 H01L29/78;H01L27/088 主分类号 H01L29/78
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