发明名称 Illumination optical system, exposure apparatus, and device manufacturing method
摘要 An illumination optical system which illuminates an irradiated plane with illumination light provided from a light source includes a spatial light modulator which is arranged in an optical path of the illumination optical system and cooperates with part of the illumination optical system to form a desired light intensity distribution at a pupil position of the illumination optical system or a position optically conjugated with the pupil position. A detection unit detects the light intensity distribution of the illumination light at a position in an optical path extending from the light source to the spatial light modulator. The detection unit includes a light receiving surface which receives some of the illumination light. A control unit controls the spatial light modulator based on the light intensity distribution detected by the detection unit.
申请公布号 US8520291(B2) 申请公布日期 2013.08.27
申请号 US20080252274 申请日期 2008.10.15
申请人 TANAKA HIROHISA;NIKON CORPORATION 发明人 TANAKA HIROHISA
分类号 G02B26/00;G02F1/29 主分类号 G02B26/00
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