发明名称 |
Illumination optical system, exposure apparatus, and device manufacturing method |
摘要 |
An illumination optical system which illuminates an irradiated plane with illumination light provided from a light source includes a spatial light modulator which is arranged in an optical path of the illumination optical system and cooperates with part of the illumination optical system to form a desired light intensity distribution at a pupil position of the illumination optical system or a position optically conjugated with the pupil position. A detection unit detects the light intensity distribution of the illumination light at a position in an optical path extending from the light source to the spatial light modulator. The detection unit includes a light receiving surface which receives some of the illumination light. A control unit controls the spatial light modulator based on the light intensity distribution detected by the detection unit.
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申请公布号 |
US8520291(B2) |
申请公布日期 |
2013.08.27 |
申请号 |
US20080252274 |
申请日期 |
2008.10.15 |
申请人 |
TANAKA HIROHISA;NIKON CORPORATION |
发明人 |
TANAKA HIROHISA |
分类号 |
G02B26/00;G02F1/29 |
主分类号 |
G02B26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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