| 发明名称 |
COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY |
| 摘要 |
PROBLEM TO BE SOLVED: To provide overcoating layer compositions for immersion lithography.SOLUTION: An organic composition for overcoating a photoresist layer contains a copolymer resin that comprises one or more hydrophilic groups. |
| 申请公布号 |
JP2013174883(A) |
申请公布日期 |
2013.09.05 |
| 申请号 |
JP20130049034 |
申请日期 |
2013.03.12 |
| 申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
GALLAGHER MICHAEL K;WANG DEYAN |
| 分类号 |
G03F7/11;G03F7/095;G03F7/26;G03F7/38;H01L21/027 |
主分类号 |
G03F7/11 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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