发明名称 |
SELF-SUPPORTING GALLIUM NITRIDE CRYSTAL SUBSTRATE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a self-supporting gallium nitride crystal substrate having a dark spot density of <2×10/cmand having a surface with a nonpolar or semi-polar plane orientation; and a method of manufacturing the self-supporting gallium nitride crystal substrate.SOLUTION: In a method of manufacturing a self-supporting gallium nitride crystal substrate: using a sapphire base substrate wherein a plurality of groove parts each having a sidewall tilting to a main plane of the base substrate and consisting of a c-plane of a sapphire single crystal, for example are formed, a gallium nitride crystal layer is formed by crystal growth in the lateral direction from the sidewall; the crystal growth is carried out until the film thickness of the crystal layer becomes ≥100 μm, preferably ≥300 μm; and then the sapphire base substrate and the gallium nitride crystal layer are separated from each other by cooling. |
申请公布号 |
JP2013193918(A) |
申请公布日期 |
2013.09.30 |
申请号 |
JP20120062425 |
申请日期 |
2012.03.19 |
申请人 |
TOKUYAMA CORP;YAMAGUCHI UNIV |
发明人 |
FURUYA TAISHI;AZUMA MASANOBU;TADATOMO KAZUYUKI;OKADA NARIHITO;YAMANE KEISUKE |
分类号 |
C30B29/38;C23C16/01;C23C16/34;C30B25/18;H01L21/205 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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