发明名称 SELF-SUPPORTING GALLIUM NITRIDE CRYSTAL SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a self-supporting gallium nitride crystal substrate having a dark spot density of <2×10/cmand having a surface with a nonpolar or semi-polar plane orientation; and a method of manufacturing the self-supporting gallium nitride crystal substrate.SOLUTION: In a method of manufacturing a self-supporting gallium nitride crystal substrate: using a sapphire base substrate wherein a plurality of groove parts each having a sidewall tilting to a main plane of the base substrate and consisting of a c-plane of a sapphire single crystal, for example are formed, a gallium nitride crystal layer is formed by crystal growth in the lateral direction from the sidewall; the crystal growth is carried out until the film thickness of the crystal layer becomes &ge;100 &mu;m, preferably &ge;300 &mu;m; and then the sapphire base substrate and the gallium nitride crystal layer are separated from each other by cooling.
申请公布号 JP2013193918(A) 申请公布日期 2013.09.30
申请号 JP20120062425 申请日期 2012.03.19
申请人 TOKUYAMA CORP;YAMAGUCHI UNIV 发明人 FURUYA TAISHI;AZUMA MASANOBU;TADATOMO KAZUYUKI;OKADA NARIHITO;YAMANE KEISUKE
分类号 C30B29/38;C23C16/01;C23C16/34;C30B25/18;H01L21/205 主分类号 C30B29/38
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