发明名称 Tracking carbon to silicon ratio in situ during silicon carbide growth
摘要 A method of: supplying sources of carbon and silicon into a chemical vapor deposition chamber; collecting exhaust gases from the chamber; performing mass spectrometry on the exhaust gases; and correlating a partial pressure of a carbon species in the exhaust gases to a carbon:silicon ratio in the chamber.
申请公布号 US8603243(B2) 申请公布日期 2013.12.10
申请号 US20080183465 申请日期 2008.07.31
申请人 VANMIL BRENDA L;LEW KOK-KEONG;MYERS-WARD RACHAEL L;EDDY, JR. CHARLES R.;GASKILL DAVID KURT;THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF THE NAVY 发明人 VANMIL BRENDA L;LEW KOK-KEONG;MYERS-WARD RACHAEL L;EDDY, JR. CHARLES R.;GASKILL DAVID KURT
分类号 C30B25/16 主分类号 C30B25/16
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