发明名称 NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PROCESSES THEREOF
摘要 The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.
申请公布号 US2013330668(A1) 申请公布日期 2013.12.12
申请号 US201213492125 申请日期 2012.06.08
申请人 WU HENGPENG;POLISHCHUK OREST;CAO YI;HONG SUNGEUN;YIN JIAN;LIN GUANYANG;PAUNESCU MARGARETA;NEISSER MARK;AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. 发明人 WU HENGPENG;POLISHCHUK OREST;CAO YI;HONG SUNGEUN;YIN JIAN;LIN GUANYANG;PAUNESCU MARGARETA;NEISSER MARK
分类号 C08F220/10;C07C245/04;G03F7/004;G03F7/20 主分类号 C08F220/10
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