发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A semiconductor device includes a substrate including first and second surfaces, a first insulating film including third and fourth surfaces, the fourth surface being in contact with the first surface, and an electrode elongated to penetrate the substrate and the first insulating film, the electrode including a first portion and a second portion. The first portion includes first and second end parts and a center part sandwiched between the first and second end part. The first and second end parts of the first portion are smaller in diameter than at least a portion of the center part of the first portion. The second portion is located between the first portion and the third surface, and includes a third end part exposed from the third surface and a fourth end part connected to the first end part of the first portion.
申请公布号 US2013328188(A1) 申请公布日期 2013.12.12
申请号 US201313964313 申请日期 2013.08.12
申请人 ELPIDA MEMORY, INC. 发明人 FUJII SEIYA
分类号 H01L25/065 主分类号 H01L25/065
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