发明名称 SUBSTRATE PROCESSING APPARATUS, COATING APPARATUS AND COATING METHOD
摘要 The invention provides a substrate processing apparatus and a coating apparatus and a coating method characterized in that a rectangular processed substrate is kept a fitting processed posture as a simple structure for stably suspending moving on a suspension loading station. A first and a second holding parts (106L, 106R) in a first (left side) and a second (right side) moving parts (84L, 84R) comprise two adsorption pads (108L, 108R) combined at the reverse (low surface) of the two corners at left side and right side of the substrate G through a vacuum adsorption force; a pair of pad support parts (110L, 110R) for inhibiting the displacement in perpendicular direction of each adsorption pad (108L, 108R) in two positions which are separated by a prescriptive space along the moving direction (X direction); and a pair of pad actuators (112L, 112R) enabling the pad support parts (110L, 110R) to respectively independently up-down moving or up-down shifting.
申请公布号 KR101351155(B1) 申请公布日期 2014.01.27
申请号 KR20080109151 申请日期 2008.11.05
申请人 发明人
分类号 B05C5/00;B65G49/06;G02F1/13 主分类号 B05C5/00
代理机构 代理人
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