METHOD FOR MANUFACTURING METAL SUBSTRATE FOR GROWING CARBON NANOTUBE, OR THE LIKE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a metal substrate capable of depositing a film by controlling the film thickness highly accurately, when depositing a catalyst film used for CNT growth on the metal substrate by sputtering film-deposition.SOLUTION: In a method for manufacturing a metal substrate used for deposition of a catalyst film for CNT growth by sputtering film-deposition, the metal substrate is thermally treated under a predetermined reduced pressure to discharge hydrogen gas before film deposition.