发明名称 SUBSTRATE ROTARY HOLDING DEVICE AND SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To hold a substrate by a constant holding force not depending on a rotation speed of the substrate without difficulty in design and manufacture.SOLUTION: A substrate processing device includes: a rotation member 28 that can rotate between a closing position at which a substrate holding member 7a is in contact with a peripheral end face of a substrate W, and an opening position at which the substrate holding member 7a is away from the peripheral end face of the substrate W; and a movement member 29 that can be displaced between a restraining position at which it is in contact with the rotation member 28 to restrain the rotation member 28 at the opening position, and a cancellation position at which it is away from the rotation member 28. When the rotation member 28 is located at the closing position, a gravity center G of the rotation member 28 is positioned in a plane passing through a rotation axial line L1 of a rotation base 6 and an opening/closing axial line L2 set in parallel to the axial line L1. Therefore, regardless of the rotation speed and the like of the substrate W, a substrate contact part 34 is pressed to a peripheral end face of the substrate W by a constant pressing force, and therefore, the substrate W is stably held.
申请公布号 JP2014045029(A) 申请公布日期 2014.03.13
申请号 JP20120185714 申请日期 2012.08.24
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MAEKAWA NAOTADA
分类号 H01L21/683;B05C11/08;B05C13/02;G03F7/20;H01L21/027;H01L21/304 主分类号 H01L21/683
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