发明名称 |
CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY |
摘要 |
A chemical vapor deposition apparatus for a flat panel display is provided. A chemical vapor deposition apparatus according to an embodiment of the present invention comprises: a lower chamber with a deposition space formed therein, on which a glass substrate for a deposition target flat panel display is arranged; an upper chamber which is combined with the lower chamber; a drawing frame which is arranged on the top of the upper chamber and is combined with the upper chamber so that at least a part of itself can relatively slide with respect to the upper chamber when the upper chamber is thermally expanded; and a center guide which is combined with the drawing frame and prevents the movement of the center of gravity of the drawing frame when the upper chamber is thermally expanded. |
申请公布号 |
KR20140051518(A) |
申请公布日期 |
2014.05.02 |
申请号 |
KR20120117588 |
申请日期 |
2012.10.23 |
申请人 |
SFA ENGINEERING CORP. |
发明人 |
PARK, MI SUNG;KONG, BYUNG YUN;KWON, SANG KYO |
分类号 |
C23C16/44;G02F1/133 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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