发明名称 PROCESSING CONTAINER STRUCTURE AND PROCESSING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a support structure which allows for improvement of in-plane uniformity of film thickness and film quality of a thin film formed while suppressing generation of turbulence of gas on both upper and lower end sides of a support structure for supporting a workpiece.SOLUTION: In a support structure for supporting a plurality of workpieces W to be processed in a processing container structure arranged to feed the processing gas in the horizontal direction from one side toward the other side, top plates 92, bottoms 94, and a plurality of support braces 96 in which a plurality of supports 100 for supporting the workpieces while coupling the top plates and the bottoms are formed, at a predetermined pitch, in the length direction, and both the distance between the support of the uppermost stage and the top plate 92 in the plurality of supports, and the distance between the support of the lowermost stage and the bottom plate 94 in the plurality of supports are set equal to or shorter than the pitch between the supports, are provided. Consequently, generation of turbulence of gas can be suppressed on both upper and lower end sides of the support structure.</p>
申请公布号 JP2014090212(A) 申请公布日期 2014.05.15
申请号 JP20140018114 申请日期 2014.02.01
申请人 TOKYO ELECTRON LTD 发明人 ASARI SHINJI ; SATO IZUMI ; MOROZUMI YUICHIRO
分类号 H01L21/31;C23C16/455 主分类号 H01L21/31
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