| 摘要 |
PROBLEM TO BE SOLVED: To solve such a problem that, since a photoresist concentration of a used stripping solution increases because of repeated and continuous usage of the solution to a certain degree, the photoresist concentration is conventionally measured in terms of an absorbance, however, a photoresist concentration cannot be accurately measured because an absorbance of a photoresist stripping solution varies with time even when the photoresist concentration is constant.SOLUTION: A device for measuring a photoresist concentration includes: a mixing and stirring tank 10 to which a photoresist stripping solution is fed; an acidic solution tank 14; acidic solution pipes 15a, 32, 15b for transporting an acidic solution from the acidic solution tank 14 to the mixing and stirring tank 10; and an absorbance meter 20 for measuring an absorbance of the solution in the mixing and stirring tank 10. Even when photoresist components with different lapse times after production are present as mixed, an accurate photoresist concentration can be obtained from the absorbance meter. |
