| 摘要 |
PROBLEM TO BE SOLVED: To provide a load lock device which promptly realizes a high vacuum with a simple structure.SOLUTION: A load lock device LL1 includes: a chamber 1 which communicates with the atmospheric air and a vacuum chamber; a holding part 3 which is disposed in the chamber 1, holds a semiconductor wafer W, and is provided so as to move in a vertical direction in the chamber 1; a lift mechanism 5 which moves up and down the holding part 3 in the vertical direction; and a pressure adjustment mechanism 7 which evacuates a space S1 defined by the chamber 1 and the holding part 3. The lift mechanism 5 includes at least two shafts 24 which are connected with the holding part 3 and are provided along the vertical direction; and a drive part which moves up and down a lift shaft member. An opening O1 which communicates with the space S1 is provided at a ceiling part 1b of the chamber 1 and the two shafts 24 are disposed so as to sandwich the opening O1. |
