发明名称 |
POLYIMIDE PRECURSOR, POLYIMIDE, AND COATING SOLUTION FOR UNDER LAYER FILM FOR IMAGE FORMATION |
摘要 |
There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1):;;where A represents a tetravalent organic group; B represents a bivalent organic group having a thiol ester bond in its main chain; R1 and R2 independently represent a hydrogen atom or a univalent organic group; and n represents a natural number. |
申请公布号 |
US2014155546(A1) |
申请公布日期 |
2014.06.05 |
申请号 |
US201414175236 |
申请日期 |
2014.02.07 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
MAEDA Shinichi;IINUMA Yosuke |
分类号 |
C09D179/08;B05D3/06 |
主分类号 |
C09D179/08 |
代理机构 |
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代理人 |
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主权项 |
1. A coating solution for an under layer film for image formation comprising:
at least one type of a compound selected from a group consisting of: (i) a polyimide precursor having a structure represented by the following formula (1):where A represents a tetravalent organic group; B represents a bivalent organic group having a thiol ester bond in its main chain; R1 and R2 independently represent a hydrogen atom or a univalent organic group; and n represents a natural number, and
(ii) a polyimide produced by dehydrating and ring closing the polyimide precursor.
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地址 |
TOKYO JP |