FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC EL DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of speedily stabilizing a discharge amount at a desired amount without reference to the state of a material.SOLUTION: A film deposition apparatus includes: a storage part which stores information on a discharge amount for a valve opening degree for each state of a material for adaptation to a difference in the discharge amount for the valve opening degree with states of the material; a determination part which determines information for a corresponding state of the material among a plurality of pieces of information stored in the storage part based upon a discharge amount detected by a discharge detection part and a valve opening degree detected by a valve opening degree detection part; and an arithmetic part which computes a valve opening degree based upon the information determined by the determination part so as to perform control to a set discharge amount.