| 摘要 |
A film formation method for forming an organic layer configured from a fluorine-containing resin on a substrate, the film formation method having a vapor deposition film forming step for forming the organic layer as a vapor-deposited film, a film thickness measuring step for measuring the film thickness of the vapor-deposited film, and a determination step for determining a parameter for feedback so as to correct a condition in the vapor deposition film forming step on the basis of the result of measuring the film thickness. |
