发明名称 |
CRYSTAL FILM, METHOD FOR MANUFACTURING CRYSTAL FILM, VAPOR DEPOSITION APPARATUS AND MULTI-CHAMBER APPARATUS |
摘要 |
To improve the single crystallinity of a stacked film in which a ZrO2 film and a Y2O3 film are stacked or a YSZ film. A crystal film includes a Zr film and a stacked film in which a ZrO2 film and a Y2O3 film formed on the Zr film are stacked, and has a peak half-value width when the stacked film is evaluated by X-ray diffraction being 0.05° to 2.0°. |
申请公布号 |
US2015030846(A1) |
申请公布日期 |
2015.01.29 |
申请号 |
US201414335121 |
申请日期 |
2014.07.18 |
申请人 |
YOUTEC CO., LTD. |
发明人 |
KIJIMA Takeshi;HONDA Yuuji |
分类号 |
H01L41/316;C30B29/16;C30B29/68;C30B29/02;C30B25/10;C30B25/08 |
主分类号 |
H01L41/316 |
代理机构 |
|
代理人 |
|
主权项 |
1. A crystal film comprising:
a Zr film; and a stacked film in which a ZrO2 film and a Y2O3 film are stacked or a YSZ film, formed on said Zr film, wherein a peak half-value width when said stacked film or the YSZ film is evaluated by X-ray diffraction is 0.05° to 2.0°. |
地址 |
Chiba JP |