发明名称 |
POLYLACTIC ACID FORMED BODY HAVING A VAPOR-DEPOSITED FILM AND METHOD OF PRODUCING THE SAME |
摘要 |
A polylactic acid formed body including a polylactic acid base material (1) and a hydrocarbon film (3) vapor-deposited on the surface of the base material by a plasma CVD method. The polylactic acid base material (1) exhibits a sharp X-ray diffraction peak in which a half-width of peak appearing in the 10°-25° wide angle X-ray measurement is not more than 1.22°, and the hydrocarbon film (3) is vapor-deposited on the surface of the polylactic acid base material (1), and includes two layers of a high CH2 layer (3a) having a ratio of CH2 per the total of CH, CH2 and CH3 of not less than 40% and a low CH2 layer (3b) formed on the high CH2 layer (3a) and having a ratio of CH2 per the total of CH, CH2 and CH3 of not more than 35%. |
申请公布号 |
US2015030792(A1) |
申请公布日期 |
2015.01.29 |
申请号 |
US201314382845 |
申请日期 |
2013.02.04 |
申请人 |
TOYO SEIKAN GROUP HOLDINGS, LTD. |
发明人 |
Ito Takuro;Ozawa Satomi;Kito Satoru;Yamazaki Kazuhiko |
分类号 |
B65D23/08;C23C16/27;B65D65/46 |
主分类号 |
B65D23/08 |
代理机构 |
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代理人 |
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主权项 |
1. A polylactic acid formed body comprising a polylactic acid base material and a hydrocarbon film vapor-deposited on the surface of the base material by the plasma CVD method, wherein
said polylactic acid base material exhibits a sharp X-ray diffraction peak in which a half-width of peak appearing in the 10°-25° wide angle X-ray measurement is not more than 1.22°, and said hydrocarbon film is vapor-deposited on the surface of the polylactic acid base material, and includes two layers of a high CH2 layer having a ratio of CH2 per the total of CH, CH2 and CH3 of not less than 40% and a low CH2 layer formed on said high CH2 layer and having a ratio of CH2 per the total of CH, CH2 and CH3 of not more than 35%. |
地址 |
Shinagawa-ku, Tokyo JP |