发明名称 |
THIN FILM TRANSISTOR SUBSTRATE, METHOD FOR FABRICATING THE SAME, AND DISPLAY DEVICE INCLUDING THE SAME |
摘要 |
A thin film transistor substrate, a method for fabricating the same, and a display device including the same are provided. In one aspect of the present invention, there is provided a thin film transistor substrate comprising a substrate, a semiconductor layer formed on the substrate, a gate insulating film formed on the semiconductor layer, a gate electrode formed on the gate insulating film, an interlayer insulating film formed on the gate electrode and including a source contact hole and a drain contact hole for exposing portions of the semiconductor layer, and a source electrode and a drain electrode respectively inserted into the source contact hole and the drain contact hole. The interlayer insulating film includes a first convex portion formed at an inlet of the source contact hole and at an inlet of the drain contact hole. |
申请公布号 |
US2015029429(A1) |
申请公布日期 |
2015.01.29 |
申请号 |
US201314136907 |
申请日期 |
2013.12.20 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
CHOI Dan Bi;LEE Jung Hun |
分类号 |
H01L27/12;G02F1/1368;H01L27/32 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
1. A thin film transistor substrate, comprising:
a substrate; a semiconductor layer formed on the substrate; a gate insulating film formed on the semiconductor layer; a gate electrode formed on the gate insulating film; an interlayer insulating film formed on the gate electrode and including a source contact hole and a drain contact hole for exposing portions of the semiconductor layer; and a source electrode and a drain electrode respectively inserted into the source contact hole and the drain contact hole, the interlayer insulating film including a first convex portion being formed at an inlet of the source contact hole and at an inlet of the drain contact hole. |
地址 |
Yongin-City KR |