发明名称 THIN FILM TRANSISTOR SUBSTRATE, METHOD FOR FABRICATING THE SAME, AND DISPLAY DEVICE INCLUDING THE SAME
摘要 A thin film transistor substrate, a method for fabricating the same, and a display device including the same are provided. In one aspect of the present invention, there is provided a thin film transistor substrate comprising a substrate, a semiconductor layer formed on the substrate, a gate insulating film formed on the semiconductor layer, a gate electrode formed on the gate insulating film, an interlayer insulating film formed on the gate electrode and including a source contact hole and a drain contact hole for exposing portions of the semiconductor layer, and a source electrode and a drain electrode respectively inserted into the source contact hole and the drain contact hole. The interlayer insulating film includes a first convex portion formed at an inlet of the source contact hole and at an inlet of the drain contact hole.
申请公布号 US2015029429(A1) 申请公布日期 2015.01.29
申请号 US201314136907 申请日期 2013.12.20
申请人 Samsung Display Co., Ltd. 发明人 CHOI Dan Bi;LEE Jung Hun
分类号 H01L27/12;G02F1/1368;H01L27/32 主分类号 H01L27/12
代理机构 代理人
主权项 1. A thin film transistor substrate, comprising: a substrate; a semiconductor layer formed on the substrate; a gate insulating film formed on the semiconductor layer; a gate electrode formed on the gate insulating film; an interlayer insulating film formed on the gate electrode and including a source contact hole and a drain contact hole for exposing portions of the semiconductor layer; and a source electrode and a drain electrode respectively inserted into the source contact hole and the drain contact hole, the interlayer insulating film including a first convex portion being formed at an inlet of the source contact hole and at an inlet of the drain contact hole.
地址 Yongin-City KR