发明名称 PLATING METHOD, PLATING SYSTEM AND STORAGE MEDIUM
摘要 A plating method can improve adhesivity with an underlying layer. The plating method of performing a plating process on a substrate includes forming a first plating layer 23a serving as a barrier film on a substrate 2; baking the first plating layer 23a; forming a second plating layer 23b serving as a barrier film; and baking the second plating layer 23b. A plating layer stacked body 23 serving as a barrier film is formed of the first plating layer 23a and the second plating layer 23b.
申请公布号 US2015030774(A1) 申请公布日期 2015.01.29
申请号 US201314384495 申请日期 2013.02.22
申请人 Tokyo Electron Limited 发明人 Tanaka Takashi;Inatomi Yuichiro;Mizutani Nobutaka;Saito Yusuke;Iwashita Mitsuaki
分类号 C23C18/16;C23C18/38;C23C18/18 主分类号 C23C18/16
代理机构 代理人
主权项 1. A plating method of performing a plating process on a substrate, the plating method comprising: a substrate preparing process of preparing the substrate; a plating layer forming process of forming a plating layer having a preset function by performing the plating process on the substrate with a plating liquid; and a plating layer baking process of baking the plating layer by heating the substrate, wherein by repeating the plating layer forming process and the plating layer baking process at least twice, a plating layer stacked body having a first plating layer obtained through a first plating layer forming process and a first plating layer baking process and a second plating layer obtained through a second plating layer forming process and a second plating layer baking process is formed.
地址 Tokyo JP