发明名称 |
PLATING METHOD, PLATING SYSTEM AND STORAGE MEDIUM |
摘要 |
A plating method can improve adhesivity with an underlying layer. The plating method of performing a plating process on a substrate includes forming a first plating layer 23a serving as a barrier film on a substrate 2; baking the first plating layer 23a; forming a second plating layer 23b serving as a barrier film; and baking the second plating layer 23b. A plating layer stacked body 23 serving as a barrier film is formed of the first plating layer 23a and the second plating layer 23b. |
申请公布号 |
US2015030774(A1) |
申请公布日期 |
2015.01.29 |
申请号 |
US201314384495 |
申请日期 |
2013.02.22 |
申请人 |
Tokyo Electron Limited |
发明人 |
Tanaka Takashi;Inatomi Yuichiro;Mizutani Nobutaka;Saito Yusuke;Iwashita Mitsuaki |
分类号 |
C23C18/16;C23C18/38;C23C18/18 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
1. A plating method of performing a plating process on a substrate, the plating method comprising:
a substrate preparing process of preparing the substrate; a plating layer forming process of forming a plating layer having a preset function by performing the plating process on the substrate with a plating liquid; and a plating layer baking process of baking the plating layer by heating the substrate, wherein by repeating the plating layer forming process and the plating layer baking process at least twice, a plating layer stacked body having a first plating layer obtained through a first plating layer forming process and a first plating layer baking process and a second plating layer obtained through a second plating layer forming process and a second plating layer baking process is formed. |
地址 |
Tokyo JP |