| 摘要 |
<p>This method for inspecting foreign materials on a substrate uses a substrate inspecting apparatus, which is provided with an image pickup unit and an image data operation unit. The method has: a step (S1) wherein a print region is extracted on the reference image data of an acceptable substrate; a step (S3) wherein the print region is expanded by a predetermined quantity and the expanded region is operated; a step (S4) wherein a print-estimated region is extracted, said region being estimated that the region is occupied by a print on the inspection image data of a substrate to be inspected, and being included in the expanded region; a step (S5) wherein corrected reference image data and corrected inspection image data are obtained by performing correction by overwriting an intermediate color on the print region of the reference image data and the print-estimated region of the inspection image data; a step (S6) wherein a region having a luminance difference is specified, said region having a predetermined luminance information difference or more when the corrected reference image data and the corrected inspection image data are compared with each other; and a step (S7) wherein presence/absence of a foreign material on the substrate to be inspected is determined on the basis of the region having the luminance difference. In the method, influences of a positional change and shading of the print on the substrate surface are reduced, and the presence/absence of the foreign material on the substrate is highly accurately determined.</p> |
