| 摘要 |
The purpose of the present invention is to provide a sputtering apparatus capable of not deforming a long film base material, which is separated from a film forming roll and sent to a transporting roll downstream, by rapid cooling. To achieve the objective of the present invention, the sputtering apparatus comprises: a vacuum chamber (14), a film forming roll (18), a target material (20), a gas supply apparatus (24), three driving rolls (downstream transporting roll) (26 (1), 26 (2), 26 (3)), and three temperature control apparatus (30 (1), 30 (2), 30 (3)) to maintain the approximate uniform temperature of each driving roll (26 (1), 26 (2), 26 (3)) in the temperature range from the lowest temperature inside the vacuum chamber (14) to 80°C. |
