| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method, an actinic ray-sensitive or radiation-sensitive resin composition, and a resist film, which simultaneously satisfy, in an extremely high level, all demands for high sensitivity, high resolution (resolving power or the like), high roughness performance, performance for decreasing film reduction, high exposure latitude, and high dry etching durability in a superfine region (for example, in a region with a line width of 50 nm or less) for solving problems in technology for improving performances in microprocessing of a semiconductor element using actinic rays or radiation, and to provide a method for manufacturing an electronic device using the above method and the composition, and an electronic device.SOLUTION: The pattern forming method includes: (1) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition; (2) exposing the film to actinic rays or radiation; and (3) developing the exposed film by using a developer containing an organic solvent. The actinic ray-sensitive or radiation-sensitive resin composition and the resist film are used for the pattern forming method. The method for manufacturing an electronic device is carried out by using the above pattern forming method and others; and the electronic device is manufactured thereby. The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin having a repeating unit of a specific structure having an aromatic ring, a repeating unit of a specific structure having an acid decomposable group, and a repeating unit of a specific structure having a crosslinking group. |
