发明名称 |
Methods of growing nitride semiconductors and methods of manufacturing nitride semiconductor substrates |
摘要 |
Methods of growing nitride semiconductor layers including forming nitride semiconductor dots on a substrate and growing a nitride semiconductor layer on the nitride semiconductor dots. The nitride semiconductor layer may be separated from the substrate to be used as a nitride semiconductor substrate. |
申请公布号 |
US8962458(B2) |
申请公布日期 |
2015.02.24 |
申请号 |
US201213599602 |
申请日期 |
2012.08.30 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Park Sung-soo;Lee Moon-sang |
分类号 |
H01L21/36;H01L21/02;C30B25/18;C30B29/40 |
主分类号 |
H01L21/36 |
代理机构 |
Harness, Dickey & Pierce, P.L.C. |
代理人 |
Harness, Dickey & Pierce, P.L.C. |
主权项 |
1. A method of growing a nitride semiconductor layer, the method comprising:
forming a plurality of nitride semiconductor dots contacting a substrate including using an oxygen-removing process and a halide vapor phase epitaxy method (HVPE), the oxygen-removing process including forming nitride seeds by reacting HCl and NH3 on a substrate, the HVPE method including reacting Ga, HCl and NH3 on the nitride seeds; and growing the nitride semiconductor layer from the nitride semiconductor dots. |
地址 |
Gyeonggi-Do KR |