发明名称 Methods of growing nitride semiconductors and methods of manufacturing nitride semiconductor substrates
摘要 Methods of growing nitride semiconductor layers including forming nitride semiconductor dots on a substrate and growing a nitride semiconductor layer on the nitride semiconductor dots. The nitride semiconductor layer may be separated from the substrate to be used as a nitride semiconductor substrate.
申请公布号 US8962458(B2) 申请公布日期 2015.02.24
申请号 US201213599602 申请日期 2012.08.30
申请人 Samsung Electronics Co., Ltd. 发明人 Park Sung-soo;Lee Moon-sang
分类号 H01L21/36;H01L21/02;C30B25/18;C30B29/40 主分类号 H01L21/36
代理机构 Harness, Dickey & Pierce, P.L.C. 代理人 Harness, Dickey & Pierce, P.L.C.
主权项 1. A method of growing a nitride semiconductor layer, the method comprising: forming a plurality of nitride semiconductor dots contacting a substrate including using an oxygen-removing process and a halide vapor phase epitaxy method (HVPE), the oxygen-removing process including forming nitride seeds by reacting HCl and NH3 on a substrate, the HVPE method including reacting Ga, HCl and NH3 on the nitride seeds; and growing the nitride semiconductor layer from the nitride semiconductor dots.
地址 Gyeonggi-Do KR