发明名称 Insulated gate type transistor and display device
摘要 A transistor comprises an active layer of an oxide containing at least one element selected from In, Ga and Zn. The active layer is formed such that a desorption gas monitored as a water molecule by a temperature programmed desorption analysis is 1.4/nm3 or less.
申请公布号 US8962457(B2) 申请公布日期 2015.02.24
申请号 US200812597219 申请日期 2008.04.30
申请人 Canon Kabushiki Kaisha 发明人 Watanabe Tomohiro
分类号 H01L21/20;H01L29/786 主分类号 H01L21/20
代理机构 Fitzpatrick, Cella, Harper & Scinto 代理人 Fitzpatrick, Cella, Harper & Scinto
主权项 1. A manufacturing method of a transistor that comprises an active layer of an oxide semiconductor containing In—Ga—Zn—O, the method comprising: forming the active layer of the oxide semiconductor while controlling water vapor partial pressure in a deposition chamber so that the active layer contains a water molecule content of 1.4/nm3 or less.
地址 Tokyo JP