发明名称 STRUCTURES AND METHODS FOR RF DE-EMBEDDING
摘要 Electrical structures, methods, and computer program products for radio frequency (RF) de-embedding are provided. A structure includes a first test device, a first through structure corresponding to the first test device, and a first open structure corresponding to the first test device. The structure also includes a second test device having at least one different physical dimension than the first test device but otherwise identical to the first test device, a second through structure corresponding to the second test device, and a second open structure corresponding to the second test device. A method includes determining a first electrical parameter of the first test device in a first DUT structure and a second electrical parameter of the second test device in a second DUT structure based on measured electrical parameters of the first and the second DUT structures, through structures, and open structures.
申请公布号 US2015057980(A1) 申请公布日期 2015.02.26
申请号 US201414526596 申请日期 2014.10.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GROVES Robert A.;LU Ning;PUTNAM Christopher S.;THOMPSON Eric
分类号 G01R27/28;G01R23/20 主分类号 G01R27/28
代理机构 代理人
主权项 1. A method of radio frequency (RF) de-embedding, comprising: measuring first scattering parameters (S-parameters) of a first set of structures comprising a first device under test (DUT) structure, a first through structure, and a first open structure, the first through and the first open structures corresponding to the first DUT structure; measuring second S-parameters of a second set of structures comprising a second device under test (DUT) structure, a second through structure, and a second open structure, the second through and the second open structures corresponding to the second DUT structure; determining a first electrical parameter of a first test device in the first DUT structure and a second electrical parameter of a second test device in the second DUT structure based on the first and the second S-parameters; and storing the first and the second electrical parameters.
地址 Armonk NY US