发明名称 PHASE SEPARATION STRUCTURE MANUFACTURING METHOD, PATTERN FORMING METHOD, AND FINE PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a structure including a phase separation structure, a pattern forming method, and a fine pattern forming method.SOLUTION: A method for manufacturing a structure having a phase separation structure is characterized by comprising: a step of forming a layer containing a block copolymer of a purity of 98% or more having a plurality of kinds of blocks combined on a substrate; and a step of phase-separating the layer containing said block copolymer. Preferably, the method further comprises: a step of forming a layer having neutralized film by applying the neutralization film to the substrate; and a step of forming a guide pattern.
申请公布号 JP2015044186(A) 申请公布日期 2015.03.12
申请号 JP20140149247 申请日期 2014.07.22
申请人 TOKYO OHKA KOGYO CO LTD 发明人 SESHIMO TAKEHIRO;DAZAI NAOHIRO;MAEBASHI TAKAYA;MIYAGI MASARU;UTSUMI YOSHIYUKI
分类号 B05D7/24;B05D3/00;C08F212/08;C08J5/18;C08J7/00;G03F7/40;H01L21/027 主分类号 B05D7/24
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