发明名称 |
PHASE SEPARATION STRUCTURE MANUFACTURING METHOD, PATTERN FORMING METHOD, AND FINE PATTERN FORMING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a structure including a phase separation structure, a pattern forming method, and a fine pattern forming method.SOLUTION: A method for manufacturing a structure having a phase separation structure is characterized by comprising: a step of forming a layer containing a block copolymer of a purity of 98% or more having a plurality of kinds of blocks combined on a substrate; and a step of phase-separating the layer containing said block copolymer. Preferably, the method further comprises: a step of forming a layer having neutralized film by applying the neutralization film to the substrate; and a step of forming a guide pattern. |
申请公布号 |
JP2015044186(A) |
申请公布日期 |
2015.03.12 |
申请号 |
JP20140149247 |
申请日期 |
2014.07.22 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
SESHIMO TAKEHIRO;DAZAI NAOHIRO;MAEBASHI TAKAYA;MIYAGI MASARU;UTSUMI YOSHIYUKI |
分类号 |
B05D7/24;B05D3/00;C08F212/08;C08J5/18;C08J7/00;G03F7/40;H01L21/027 |
主分类号 |
B05D7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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