| 摘要 |
<p>1333 n3n3 n22nn+An aqueous alkaline composition for treating the surface of silicon substrates the said composition comprising: (A) a quaternary ammonium hydroxide; and (B) a component selected from the group consisting of water soluble acids and their water soluble salts of the general formulas (I) to (V): (R S0 )nXn+ (I) R P02 (Xn+) (II); (RO S03 )nXn+ (III) RO P02 (X+) (IV) and [(RO)P0 ] X (V); wherein the n = 1 or 2; X is hydrogen ammonium or alkaline or alkaline earth metal; the variable R1 is an olefinically unsaturated aliphatic or cycloaliphatic moiety and R is R1 or an alkylaryl moiety; and (C) a buffer system wherein at least one component other than water is volatile; the use of the composition for treating silicon substrates a method for treating the surface of silicon substrates and methods for manufacturing devices generating electricity upon the exposure to electromagnetic radiation.</p> |
